The inner dense layer peculiar to the PSE membrane reliably retains fine particles as small as 0.03 µm.
There is hardly any decline in the flow rate as compared with the conventional 0.05 µm cartridge.
The structure peculiar to the PSE membrane offers a long service life.
Since the cartridge employs a PSE membrane that has been received a favorable reputation, it is best suited for the following lines that require the removal of ultra-fine particles.
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Final filtration of plating fluids, developers, etc.
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Filtration of purified water or chemicals for cleaning equipment in wafer manufacturing processes
