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GKR series are positive tone KrF photoresist systems that cover a wide range of applications.
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications
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