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India
Semiconductors Photoresist E-Beam

e-Beam

Positive and negative tone resist series for a wide array of e-beam imaging applications

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Features & Benefits

  • Superior resolution
  • Wide process windows

Product Summary

FEP series

  • The FEP series of products are suited to work with a wide array of applications requiring positive tone imaging with e-beam exposure.

FEN series

  • The FEN series of products are suited to work with a wide array of applications requiring negative tone imaging with e-beam exposure.
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