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ArF (193nm)

Materials for positive dry and immersion imaging, and negative tone development (NTD)

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Features & Benefits

Wide array of high resolution imaging systems for 193 nm exposure including positive dry and immersion imaging and negative tone development (NTD)

High throughput
Superior resolution
Wide process windows
Low defect levels
Vertical profiles

Product Summary

GAR series
The GAR series of products are suited to work with a wide array of applications requiring 193nm dry exposure
FAiR series for PTD
The FAiR series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and positive tone development
FAiR series for NTD
The FAiR series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and negative tone development

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