Copper CMP Slurries - Overview

• High removal rates, high planarization efficiency, low topography, low defectivity, and excellent over polish margins
• Tunable formulations – with independent component knobs for customers’ specific performance targets
• High selectivity to common barrier films resulting in easy end-point detection and good copper residual clearing without compromising topography
• Strong Prestonian behavior in copper polishing for easy process development and control
• Low cost of ownership due to highly concentrated formulations
• Ease of use – special cleaning chemistries or process conditions are not required

Market-leading products are available to meet the performance requirements for a broad range of process and technology requirements.

• CSL9044C
  • Developed for a wide variety of devices including leading edge circuits
  • Well proven and established product in copper applications
  • Provides high removal rates to maximize process throughput
  • High selectivity to barrier films
  • Low defectivity
  • Excellent copper clearing capability
  • High planarization efficiency
  • Low dishing and erosion
  • Robust process can be developed for a great range of applications from mature technology nodes to the most advanced nodes including thick metal layers
• CSL9400C
  • Developed for leading edge circuits
  • Higher removal rates to maximize process throughput and reduce copper polish to one (1) platen
  • Excellent selectivity to barrier films
  • Significantly low defectivity
  • Excellent copper clearing capability
  • Low but tunable dishing and erosion
  • Suitable for a range of technology nodes including logic, memory or thick metal polishing
• CSL9500C
  • Developed for leading edge circuits including Ruthenium liner integrations
  • Provides high removal rates to maximize process throughput
  • Excellent selectivity to barrier films
  • Ultra low defectivity
  • Excellent copper clearing capability
  • Low but tunable dishing and erosion
  • Suitable for the most advanced integration applications
• CSL9215C
  • Developed for very thick metal applications
  • Removal rates to maximize process throughput for TSV copper polish
  • Excellent selectivity to barrier films
  • Low defectivity
  • Excellent copper clearing capability
  • Topography following copper clear meets TSV requirements
• CSL9300C
  • Developed for defect sensitive applications
  • Ultra low defectivity, particularly for scratches
  • Best suited for semi-hard pad copper bulk processing for great planarization efficiency, low topography, and excellent copper clearing
  • Excellent selectivity to barrier materials and low k materials, especially for advanced applications with thin barrier layers
  • Provides high removal rates to maximize process throughput

Contact Us for more information and a complete product overview