Austria
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Leading supplier of photoresists offering a wide array of imaging products -
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
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i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
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Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
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e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications
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