Austria

Photoresists

Leading supplier of photoresists offering a wide array of imaging products

Contact Us
FUJIFILM Electronic Materials offers a wide range of advanced imaging products, to meet the needs of its customers around the world.

The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.

Product Lineup

Women wearing surgical mask and safety glasses around blue molecules

ArF (193nm)

Materials for positive dry and immersion imaging, and negative tone development (NTD)
man holding silicon wafer

KrF (248nm)

Positive tone KrF photoresists covering a broad range of applications
Macro Silicon Wafer

i-Line, g-Line and Broadband

Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
Macro Silicon Wafer

Negative (Polyisoprene-based)

Multiple series of negative tone, polyisoprene-based resist systems
Semiconductors Photoresist E-Beam

e-Beam

Positive and negative tone resist series for a wide array of e-beam imaging applications
Contact Us