Select Your Location

This is Fujifilm Austria website.
To browse products and services available in your area,
please choose another country or region.

See all countries and regions

You are accessing from the United States. To browse Fujifilm USA website, please click the following link.

Fujifilm USA Website
Women wearing surgical mask and safety glasses around blue molecules

ArF (193nm) - Overview

Materials for positive dry and immersion imaging, and negative tone development (NTD)

Features & Benefits

Wide array of high resolution imaging systems for 193 nm exposure including positive dry and immersion imaging and negative tone development (NTD)

  • High throughput
  • Superior resolution
  • Wide process windows
  • Low defect levels
  • Vertical profiles

Product Summary

  • GAR series
    The GAR series of products are suited to work with a wide array of applications requiring 193nm dry exposure
  • FAiR series for PTD
    The FAiR series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and positive tone development
  • FAiR series for NTD
    The FAiR series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and negative tone development