Materials for positive dry and immersion imaging, and negative tone development (NTD)
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for applications encompassing sub-0.30 µm to >1.0 µm resolution
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications