Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution on varied substrates over a large range of resist thickness.
- Advanced i-Line Resists for Non-reflective Substrates
Resist families designed for demanding critical CD (<350 nm) printing on non-reflective substrates :- OiR 620 series
- OiR 674 series
- Advanced i-Line Resists for Non-reflective Substrates
Resist families designed for demanding critical CD (<350 nm) printing on non-reflective substrates : - Advanced i-Line Resists for Reflective Substrates
Resist series offering fast photospeed options for advanced resolution (>350 nm CD) patterning on reflective substrates :- OiR 674 series
- GiR 1102 series
- GiR 2201 series
- Multi-purpose High Resolution i-Line Resists
Resist series offering fastest photospeed options for high throughput, high resolution (>500 nm CD) and robust patterning:- OiR 305 series
- OiR 366 series
- OiR 906 series
- OiR 907 series
- Multi-purpose Cross-over g- and i-Line Resists
Resist series offering robust patterning for g-line, i-line and broadband (>800 nm CD):- HiPR 6500 series
- HPR 510 series
- Dyed Resists for Highly Reflective Substrates
Resist series offering non-bleaching, high optical densities for CD and notching control on highly reflective substrates:- OiR 906MD
- OiR 906HD
- OiR 305HC
- HiPR 6500GH
- HiPR 6500HC
- i-Line Resists for Thicker Applications
Resist series for thicker film patterning needs ranging from 3 to 13 µm film thickness:- FHi-560EP
- GiR 3114
- OiR 305
- OiR 908
