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- Outstanding corrosion protection for sensitive cobalt features
- Compatibility with a wide range of integration schemes including varies dielectrics, etch hard masks, and ARC layers
- Tunable selectivity to meet customized film stacking and final finishing targets
- Attractive cost of ownership – Concentrated formulations available to provide lower cost at point-of-use
Market-leading products are available to meet a broad range of process and technology requirements.
Available Cobalt CMP Slurries
- MSL5100C
- Step 1 Cobalt slurry platform for removal of damascene Co metal features
- Highly concentrated for low cost of ownership
- Proprietary corrosion inhibitor system provides excellent corrosion protection of Cobalt metal
- Good planarization efficiency
- Tunable selectivity to Ti and TiN
- MSL5200C
- Step 2 Cobalt slurry platform for final polish of damascene Co metal and dielectric features
- Concentrated formulation for attractive cost of ownership
- Tunable Co removal rate, independent of other films
- Excellent surface finish with excellent Cobalt metal protection
