United States

To polish and planarize complex layers of integrated circuits

CMP Slurries

CMP slurries are employed to polish and planarize complex layers of integrated circuits to customer specific requirements. FUJIFILM Electronic Materials offers variety of CMP slurries to support a broad range of technology nodes and process integration requirements, allowing our customers to achieve excellent product yields and reliability at a compelling cost of ownership.

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Copper CMP Slurries

FUJIFILM Electronic Materials copper CMP slurries are designed to remove the copper overfill to expose underlying damascene interconnects.

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Barrier CMP Slurries

FUJIFILM Electronic Materials barrier CMP slurries are designed to remove the barrier metals that are exposed following the copper clearing step as well as to planarize all films across the wafer surface.

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Emerging Metal Slurries

FUJIFILM Electronic Materials Cobalt CMP slurries are designed to polish cobalt and barrier metals and planarize all films in the circuits during advanced Cobalt interconnect polish.

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Front End CMP Slurries

FUJIFILM Electronic Materials Front End CMP slurries are designed for devices that utilize advanced transistor technologies such as high-K metal gates, advanced dielectrics, 3-dimensional FinFET transistors, and self-aligned contacts.

Metal Slurry in a beaker
Post CMP Cleaners

FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.