- Efficient particle removal
- Excellent organic cleanability
- Outstanding corrosion protection for sensitive metal features
- Attractive cost of ownership – Concentrated cleaners provide lower cost at point-of-use
Product Lineup
- Clean-100
- Industrial Standard Cu-pCMP Cleaner
- Acidic pH Platform
- Low Cu SER
- Good Cleanability for Particle and Organic residue
- WCP-200
- Industrial Standard W-pCMP Cleaner
- Neutral pH Platform
- Low W SER
- Good Cleanability for Particle and Organic residue
- FCN100XC
- Designed as pCMP Cleaners for W, Mo and dielectric layers
- Acidic pH Platform (FCN1003C)/ Neutral pH (FCN1006C) for better metal corrosion protection
- Better Cleanability for Particle and Organic residue on Ox, SiN and poly-Si
- Optimal cleaning bundling as on-platen buff chemistry and pCMP
- FCN300XC
- Designed as CIP of WCP-200, W-pCMP Cleaner. Also can be used for Mo application.
- Neutral pH platform (FCN300C), Alkaline pH Platform (FCN3003C), Acidic pH Platform (FCN3004C)
- Low W SER
- Higher selectivity for WOx/W
- Improved Particle and Organic residue removal
- Enhanced cleanability for Tiny Particle in advance node process
- Optimal results as on-platen buff chemistry and pCMP 2-in-1 applications
- CCN9002C
- Designed as Advanced Cu-pCMP Cleaner
- Alkaline pH Platform
- Low Cu and Co SER
- Used for Ru application
- Good Cleanability for Particle and Organic residue
- Designed for use on-platen buff chemistry and pCMP
- CCN9005C
- Designed as Advanced Cu-pCMP Cleaner
- Alkaline pH Platform
- Low Cu and Co SER
- Used for Ru application
- Good Cleanability for Particle and Organic residue
- Designed for use on-platen buff chemistry and pCMP
