Products & Solutions
6 Products Found
Photoresists
Leading supplier of photoresists offering a wide array of imaging products
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications
Photoresist Ancillaries
A wide range of wet chemistries for the lithographic process
Developers
Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
Solvents
Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
Photoresist Strippers
Solvent based strippers for positive and negative tone photoresist removal
Wave Control Mosaic (Color Resist)
Color Mosaic® for on-chip color filters in image sensors and other optical applications.
RGB
Primary color filters for image sensor (IS) applications
CMY
Complementary color filters for image sensor (IS) applications
Transparent
Highly transparent materials for image sensor (IS) applications
Black
Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications
Ancillaries
Edge bead removers, backside rinse and optimized developers for optimal processing
IR
Selective IR control for sensing applications
CMP Slurries
Chemical mechanical planarization (CMP) is a critical process in the fabrication of advanced semiconductor devices or “microchips” used in today’s electronics.
Copper CMP Slurries
FUJIFILM Electronic Materials copper CMP slurries are designed to remove the copper overfill to expose underlying damascene interconnects.
Barrier CMP Slurries
FUJIFILM Electronic Materials barrier CMP slurries are designed to remove the barrier metals that are exposed following the copper clearing step as well as to planarize all films across the wafer surface.
Emerging Metal Slurries
FUJIFILM Electronic Materials Cobalt CMP slurries are designed to polish cobalt and barrier metals and planarize all films in the circuits during advanced Cobalt interconnect polish.
Front End CMP Slurries
FUJIFILM Electronic Materials Front End CMP slurries are designed for devices that utilize advanced transistor technologies such as high-K metal gates, advanced dielectrics, 3-dimensional FinFET transistors, and self-aligned contacts.
Post CMP Cleaners
FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.
Polyimides and PBO's
Materials for stress relief buffer coat or redistribution layer
Photosensitive - Aqueous Developable
PBO based products designed and optimized for buffer coat and RDL
Photosensitive - Solvent Developable
Designed for thick film capability, robust processing and with excellent mechanical properties
Non-Photosensitive
Materials for low shrinkage, low temperature and lift off applications
Ancillaries
Additional ancillary chemicals for use with our polyimide and PBO products
Cleaners and Etchants
Wet chemistries to strip or etch photoresist & other materials
CVD Precursors & Chemical Delivery Systems
Cost saving solutions for the semiconductor industry
Advanced Low K
Advanced dielectrics for 45/22 nm node and below
Gap Fill and Recovery
Supporting chemistry for low K dielectrics
Dielectric and Dopant Sources
High purity precursors supported by state of the art analytical testing and production
Others
Chlorine sources, adhesion promoters, etchants, cleaners, reducers
Distribution Equipment
Chemical delivery systems designed with an open architecture compatible to many chemistries
Temperature Controller
Precision temperature control of your precursor with the ease of front loading
Photovoltaic Precursors & Equipment
A total supply chain solution
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