Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
Developers
Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
Photoresist Strippers
Solvent based strippers for positive and negative tone photoresist removal