United States

Photoresist Ancillaries

A wide range of wet chemistries for the lithographic process

We offer a wide range of chemistries for the lithographic process including pre-wet, edge bead removal, cup rinse, development, photoresist stripping, removal and rinse

silicon wafer

Developers

Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems

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Solvents

Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications

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Photoresist Strippers

Solvent based strippers for positive and negative tone photoresist removal