Gap Fill and Recovery: Applications | Fujifilm [United States]

Advanced Low K

Advanced dielectrics for 45/22 nm node and below

Dielectric and Dopant Sources

High purity precursors supported by state of the art analytical testing and production

Others

Chlorine sources, adhesion promoters, etchants, cleaners, reducers

Distribution Equipment

Chemical delivery systems designed with an open architecture compatible to many chemistries

Temperature Controller

Precision temperature control of your precursor with the ease of front loading

Gap Fill and Recovery - Applications