Low K materials are used for devices requiring low power consumption and high speed
United States
Advanced Low K
Advanced dielectrics for 45/22 nm node and below
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Cost saving solutions for the semiconductor industry -
Gap Fill and Recovery
Supporting chemistry for low K dielectrics
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Dielectric and Dopant Sources
High purity precursors supported by state of the art analytical testing and production
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Others
Chlorine sources, adhesion promoters, etchants, cleaners, reducers
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Distribution Equipment
Chemical delivery systems designed with an open architecture compatible to many chemistries
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Temperature Controller
Precision temperature control of your precursor with the ease of front loading
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