We offer a broad range of diluted Hydrofluoric (HF) ratios, specialty Buffered Oxide Etchants (BOE) - with/without surfactant, Mixed Acid etchants (MAE) & specialty metal etchants
Product Lineup
- Buffered Oxide Etchants
- Fujifilm has advanced capabilities for the precise blending of Buffered Etchants with tight assay specification ranges, available in multiple NH4F:HF ratios
- Utilized to etch SiO2 films.
- Utilized as pre-diffusion and pre-metallization surface preparations
- Formulated from high purity 49% Hydrofluoric Acid and high purity 40% Ammonium Fluoride.
- Available with and without surfactant.
- Dilute HF
- Fujifilm has advanced capabilities for the precise blending of dilute HF with tight assay specification ranges.
- Freckle Etch
- For the removal of residual silicon nodules left after etching aluminum-silicon-copper layers.
- For the selective removal of specific metal layers Fujifilm offers various specialty etchants, including Specialty Aluminum Etchants, Immersion etchants for aluminum metallization layers - Available with or without the Fujifilm Aluminum Etch Surfactant (AES) Custom Engineering.
