South Korea
i-Line, g-Line and Broadband - Applications
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
-
Leading supplier of photoresists offering a wide array of imaging products -
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
-
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
-
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
-
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications
-