History of pattern shrinkage for lithography
Pattern shrinkage and light source
Pattern shrinkage has been driven by shorter exposure wave length.
Pattern view
Advantage of FUJIFILM NTI process - PAG connected PDQ (PCP)
By employing PCP, we were able to achieve a significant reduction in LWR of 17%.
Advantage of FUJIFILM NTI process - NEW developer DP819A
New developer, DP819A was born to achieve impressive resolution with EUV exposure.
