![](https://asset.fujifilm.com/www/kr/files/2020-02/5f09a1d0369d42886b33129d5c944e25/e-beam-applications.png)
Positive and negative tone resist series for a wide array of e-beam imaging applications
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems