
Highly effective aqueous post etch cleaners compatible with Al, Cu, and ultra low-k BEOL processes.
Contact Us for more information on the most suitable Fujifilm cleaners for your process needs.
Aqueous post etch cleaners compatible with aluminum, copper, and advanced metal alloys, anti-reflective layers, SiO2 and ultra low-k dielectrics
Highly effective aqueous post etch cleaners compatible with Al, Cu, and ultra low-k BEOL processes.
Contact Us for more information on the most suitable Fujifilm cleaners for your process needs.