These materials are used for wet removal of bulk and thick plating photoresist in single wafer and batch processes
United States
Photoresist Strippers - Applications
Solvent based strippers for positive and negative tone photoresist removal
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A wide range of wet chemistries for the lithographic process -
Developers
Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
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Solvents
Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
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