Black material series of Color Mosaic® are negative tone imaging materials. These non-carbon high optical density (O.D) type materials have high shielding and low reflection performance for visible and NIR light blocking applications. Application examples are Image sensor, Black matrix, Optical black area use(Chip frame shielding), Shielding for chip backside, Wafer level lens, etc.
United States
Black
Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications
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Color Mosaic® for on-chip color filters in image sensors and other optical applications. -
RGB
Primary color filters for image sensor (IS) applications
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CMY
Complementary color filters for image sensor (IS) applications
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Transparent
Highly transparent materials for image sensor (IS) applications
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Ancillaries
Edge bead removers, backside rinse and optimized developers for optimal processing
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IR
Selective IR control for sensing applications
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