Welcome to FUJIFILM Electronic Materials Process Chemicals—formerly CMC Materials EC, Inc. on October 2, 2023.
Our technology leadership and close customer collaboration ensure excellent product quality and consistent production of advanced electronic chemicals used to enable the high-performing devices of today and the next generation of technology.
- Semiconductor manufacturing
- Silicon wafers
- Photomasks
- Photovoltaic (solar cell panel) manufacturing
- Flat panel display manufacturing
- Hard disk drives (HDD)
We offer a broad line of semiconductor-grade wet chemicals with products ranging from single digit parts-per-trillion (ppt) to parts-per-billion (ppb) cation levels depending on your needs.
Our high-purity electronic chemical portfolio includes acids and bases, solvents and solvent blends, and unique bespoke mixtures. These products are supplied in a variety of concentrations and shipping options, from bottles and drums to totes and ISO tankers.
- Acetic
- Hydrochloric
- Hydrofluoric
- Hydrogen peroxide
- Nitric
- Nitric acid fuming
- Phosphoric
- Ammonium hydroxide
- Ammonium fluoride
- Potassium hydroxide
- Sodium hydroxide
- Acetone
- DMSO
- Ethyl lactate
- Hexamethyldisilazane
- Isopropanol
- Methanol
- N-Butyl acetate
- N-methylpyrrolidone
- PGMEA
- Etchants
- Buffered oxide etchants available in ratios from 5:1 to 500:1
- Unique surfactants for BOE range
- Mixed acid etchants for many unique processes including spin tool silicon etching
- Wide range of metal etchants including aluminum, copper, chromium, gold, nickel, platinum, tantalum, and titanium
- Includes mixtures for metal alloys and ITO materials
- Post Etch Removal
- For removal of both positive and negative resists including post-etch polymers
- Low etch rates for a variety of materials
- Effective organic residue removers
- Stable formulated product
- Proprietary Nano-Strip® and GenSolve™ photo-resist and post-etch residue removal
- Solvent Blends
- Cleaning in semiconductor and related high-purity processes
- Various etch-polishing processes
- Ultra-low-residue vapor drying
- Adhesion promoters for photoresists
- Positive and negative photoresist stripping agents
- Flat panel display manufacturing
- Photoresist edge-bead-remover agents
- High-purity intermediates for photoresist, spin-on-glass, low-k dielectric materials and anti-reflective coatings
- Carriers for photoresist, abrasives, solvents, and lubricants
- Coolants, wetting agents, and thickeners
