![](https://asset.fujifilm.com/www/uk/files/2020-02/0944bb6027e85d631005d2fdd63fc0f4/pic_02-iline.jpg)
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications