Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications
| Advantages | Processing with standard semiconductor equipment Thinner film thickness and good uniformity Low reflectance Small resolution down to 10um Excellent shielding performance for NIR(NCB) |
| Spectrum | Visible and near infrared (NIR) light sources |
| Transmittance | Non Carbon Black(NCB): Extremely low through 300-1800nm Color pigment based: Extremely low through 300-700nm |
| Exposure Dose | 50~2500mJ/cm2 (i-line) |
| Resistance | Excellent heat and light resistance |
| Environment | EHS approved raw materials |
| Packing | Quart glass bottle with 0.76L Gallon glass bottle with 2.89L |
- Non Carbon Black (NCB)
- Color Pigment Based
