![](https://asset.fujifilm.com/www/pt/files/2022-04/2d80bad301b5d8c10e0a966baccb76c4/pic_02-arf-applications.jpg)
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications