TOKYO, October 29, 2024 – FUJIFILM Corporation announced the sales of negative-tone resists and developer for EUV*1 lithography used in advanced semiconductor manufacturing processes.
Fujifilm was the first in the world to develop and commercialize the NTI process*2, a widely adopted negative development process and has led the way in miniaturization of semiconductor circuits using ArF lithography*3. By providing negative-tone EUV resist and EUV developer compatible with the evolved NTI process for EUV, Fujifilm optimizes the circuit pattern formation process and contributes to further miniaturization.
In conjunction with the commencement of EUV resist and EUV developer sales, Fujifilm will enhance the production and quality evaluation functions for EUV resist and EUV developer at its two sites in Shizuoka, Japan and Pyeongtaek, South Korea.
Driven by high-speed, high-capacity communications through 5G/6G, the expansion of autonomous driving, and the spread of AI and the metaverse, demand for semiconductors is expected to increase and their performance is projected to advance as well. EUV lithography, which uses extremely short-wavelength light to draw fine circuit patterns on wafers, is garnering increasing attention as a technology that enables the miniaturization of semiconductor circuits essential for enhancing semiconductor performance. With the anticipated proliferation of manufacturing processes using EUV lithography, the market for EUV resist, which are essential materials in these processes, is projected to grow at an annual rate of approximately 20%*4. Similarly, the market for EUV developer is also expected to expand.
Fujifilm offers NTI developer*5, which uses organic solvents to enable the formation of sharper and finer circuit patterns, not only for ArF lithography but also for EUV lithography. NTI developer achieves high patterning precision by using high-purity organic solvents instead of traditional alkaline developers, thus suppressing resist swelling during development. Fujifilm was the first company to develop the NTI process, which has become the industry standard, and has contributed to the miniaturization of circuit patterns.
Fujifilm has started the sale of EUV resist for the manufacturing processes utilizing EUV lithography technology. Fujifilm have introduced a photo-decomposable quencher-connected photoacid generator (PCP)*6 with a reaction control function for photoresists, utilizing the functional molecule technology cultivated through its development of conventional photoresists. By maintaining a uniform acid concentration within the resist film during EUV exposure, Fujifilm has successfully reduced the fluctuation in circuit patterns, a challenge of conventional chemically amplified resists, by approximately 17%*7.
In addition, Fujifilm has also introduced new EUV developer. By refining the formulation of organic solvents, Fujifilm has evolved its unique NTI developer specifically for EUV applications. EUV developer minimizes the swelling of the resist during development to the utmost limit, contributing to further miniaturization of circuit patterns.
In conjunction with the launch of EUV resist and EUV developer, Fujifilm will enhance the production and quality evaluation functions for EUV resist and EUV developer. At the Shizuoka site in Japan, Fujifilm strengthens the production and quality evaluation functions for EUV resist by introducing state-of-the-art production equipment and inspection devices. At Pyeongtaek site in Korea, Fujifilm enhances the production and quality evaluation functions for EUV resist and EUV developer. In addition to installing a cleanroom, Fujifilm also introduces state-of-the-art production equipment and inspection devices. The equipment to be introduced at both sites is scheduled to begin operations in October 2025.
Fujifilm offers semiconductor materials used in wafer processing to post processing in semiconductor manufacturing including photoresists*8, photolithography-related materials*9, CMP slurries*10, post-CMP cleaners*11, thin-film chemicals*12, polyimides*13 and high-purity process chemicals*14, as well as WAVE CONTROL MOSAIC™*15 which includes color filter materials for image sensors. In addition to its extensive product lineup covering almost the entire range of semiconductor manufacturing processes, from leading-edge to legacy semiconductors, Fujifilm is committed to solving customers' issues and contribute to the development of the semiconductor industry by providing one-stop solutions that leverage its global supply structure and advanced R&D capabilities.
Capital Investment Overview
1. Shizuoka Site
- 1. Location
Kawajiri, Yoshida-cho, Haibara-gun, Shizuoka Prefecture, Japan
- 2. Description
For expanding production capacity and enhancing quality evaluation functions for EUV resist (including the introduction of production and inspection equipment)
- 3. Operation commencement
October, 2025
2. Pyeongtaek, South Korea Site
- 1. Location
Pyeongtaek City, Gyeonggi Province, Republic of Korea (Oseong Industrial Complex)
- 2. Description
For expanding production capacity and enhancing quality evaluation functions for EUV resist and developer (including installation of clean rooms and introduction of production and inspection equipment)
- 3. Operation commencement
October, 2025
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