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Black - Applications

Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

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Overview
Applications

Black material series of COLOR MOSAIC™ are negative tone imaging materials. These non-carbon high optical density (O.D) type materials have high shielding and low reflection performance for visible and NIR light blocking applications. Application examples are Image sensor, Black matrix, Optical black area use(Chip frame shielding), Shielding for chip backside, Wafer level lens, etc.

Transmission Curve

Graph showing the transmittance of NCB-1 (film thickness: 1.3um) increases as the wavelength increases above 1200nm (transmittance is about 10% at 1800nm), with NCB-2 (film thickness: 3.5um) is less than 1% even at longer wavelengths.

Resolution (NCB-1, FT1.3)

SEM image of NCB-1 (film thickness: 1.3um) developed.

Application Example

Image showing how the black matrix blocks visible light from the boundaries and prevents flare and ghosting.
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