In order to provide you with a better browsing experience and to improve our site functionality, we use cookies and other tracking technologies. Detailed information on the use of cookies on our site and how to opt out is provided in our Cookie Policy. By clicking into any content on this site, you consent that we can store and access cookies and other tracking technologies as described in our Cookie Policy.

Malaysia

Black - Applications

Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

Black material series of Color Mosaic® are negative tone imaging materials. These non-carbon high optical density (O.D) type materials have high shielding and low reflection performance for visible and NIR light blocking applications. Application examples are Image sensor, Black matrix, Optical black area use(Chip frame shielding), Shielding for chip backside, Wafer level lens, etc.