In order to provide you with a better browsing experience and to improve our site functionality, we use cookies and other tracking technologies. Detailed information on the use of cookies on our site and how to opt out is provided in our Cookie Policy. By clicking into any content on this site, you consent that we can store and access cookies and other tracking technologies as described in our Cookie Policy.

Malaysia
Macro Silicon Wafer

Photosensitive - Solvent Developable - Overview

Designed for thick film capability, robust processing and with excellent mechanical properties

Fujifilm’s solvent developable polyimides are a family of photo-imageable polyimide precursors, covering both high and low cure temperatures for edistribution layer (RDL) and buffer coat applications.

  • Negative acting, solvent developable polyimides
  • Photo-imageable using g-line and/or i-line exposure tools
  • Low or high temperature cure options
  • Fast photospeed for high throughput
  • Excellent mechanical properties for high reliability
  • NMP free offerings for both high and low temperature cure

See Product Overview and Datasheets for more details

Product Summary
  • LTC 9300 Series: Low temperature cure polyimides are photo-imageable polyimide precursors which are sensitive both in g- and i-line. They can therefore be imaged on all exposure tools. LTC 9300 series polyimides are ideally suited for redistribution layer applications for advanced packaging.
  • Durimide® 8300 Series: High temperature cure polyimides are photo-imageable polyimide precursors which are sensitive both in g- and i-line. They can therefore be imaged on all exposure tools. Durimide® 8300 series polyimides are ideally suited for buffer coat application in high reliability packages.