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Precision temperature control of your precursor with the ease of front loading
The TC 2000 family offers an accurate control of your precursor temperature during processing, guaranteeing a steady vapor pressure.
TC2000™ -Temperature controller
Advanced Low K
Advanced dielectrics for 45/22 nm node and below
Gap Fill and Recovery
Supporting chemistry for low K dielectrics
Dielectric and Dopant Sources
High purity precursors supported by state of the art analytical testing and production
Others
Chlorine sources, adhesion promoters, etchants, cleaners, reducers
Distribution Equipment
Chemical delivery systems designed with an open architecture compatible to many chemistries
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