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Japan

November 14, 2024

Fujifilm Earns “Best in Value Award” from Samsung Electronics

TOKYO, November 14, 2024 – FUJIFILM Corporation announced that it earned “Best in Value Award” from Samsung Electronics Co., Ltd. in the semiconductor materials business.

The “Best in Value Award” is an annual award presented by Samsung Electronics to companies that provide “best value” including excellent products and services. Fujifilm was recognized for its efforts to solve Samsung Electronics' issues and contribute to the growth of its semiconductor business through providing cutting-edge semiconductor materials and establishing a production and quality assurance system at a newly built production site in Pyeongtaek, South Korea.

Fujifilm offers semiconductor materials used in wafer processing to post processing in semiconductor manufacturing including photoresists*1, photolithography-related materials*2, CMP slurries*3, post-CMP cleaners*4, thin-film chemicals*5, polyimides*6 and high-purity process chemicals*7, as well as WAVE CONTROL MOSAIC™*8 which includes color filter materials for image sensors. In addition to its extensive product lineup covering almost the entire range of semiconductor manufacturing processes, from leading-edge to legacy semiconductors, Fujifilm is committed to solving customers' issues and contribute to the development of the semiconductor industry by providing one-stop solutions that leverage its global supply structure and advanced R&D capabilities.

  • * WAVE CONTROL MOSAIC is a registered trademark or trademark of FUJIFILM Corporation.
  • *1 Material used to coat wafer substrate when circuit patterns are drawn in the process of semiconductor manufacturing
  • *2 Development solutions, cleaners and other materials used in the photolithography process of semiconductor manufacturing
  • *3 A polisher for evenly levelling semiconductor surface, which contains a mixture of wires and insulation films of varying hardness.
  • *4 Cleaners used after polishing with CMP slurry to remove particles, minute metal fragments and organic residues while protecting the metal surface
  • *5 Materials for forming low-dielectric insulation films
  • *6 A material with strong heat resistance and insulation properties, used for forming semiconductors’ protective films and rewiring layer
  • *7 High-purity chemicals used in the cleaning and drying processes. The chemicals are employed to remove contaminants during the cleaning and drying stages of semiconductor manufacturing, as well as to eliminate metals and oils during the etching process.
  • *8 General term referring to a group of functional materials for controlling electromagnetic light waves in a broad range of wavelengths, including photosensitive color materials for manufacturing color filters for image sensors such as CMOS sensors, used in digital cameras and smartphones

Contact

FUJIFILM Corporation
Electronic Materials Business Division

E-mail:shm-ff-em_inquiries@fujifilm.com

  • * Please note that the contents including the product availability, specification, prices and contacts in this website are current as of the date of the press announcement and may be subject to change without prior notice.