Today's critical photoresist applications demand precision stripping, removal and rinse characteristics Therefore, we have developed a complete line of EBR solutions that provides world-class edge bead removal while maintaining the industry standard for purity, packaging, and environmental protection
Fujifilm has a wide range of solvents available to suit all applications. Our products are manufactured in state-of-the-art facilities and meet the highest global quality standards for particles, trace metals, and organic contaminants. In addition to straight solvents Fujifilm also support custom blends for unique or customer specific applications.
Product Lineup
- Alcohols and ketones: (Methanol, Acetone, MEK, Ethanol, IPA, MIBC, MIBK, Cyclopentanone, Cyclohexanone)
- Acetates, Lactones, Ethers: (PGME, PGMEA, GBL, EL, nBA)
- EUV Solvents and Custom Blends (see your Fujifilm Account Manager)
Features & Benefits
- Ultra-high purity solvents for defect reduction
- Advanced EUV solvent for high patterning precision and reduced resist swelling characteristics
- Custom processing and blends
- State-of-the-art analytical tools used to assure product purity and quality.
- Regionalized sourcing: US, Europe and Asia manufacturing and packaging
- Packaging options :
- 1L-4L Glass bottles
- NOWPak
- Drums: Stainless Steel, PFA, HDPE
- IBC: Stainless Steel, PFA, HDPE
- ISOtainer
NOWPak is a trademark or registered trademark of Entegris, Inc. in the United States and/or other countries.
