Photoresists | Fujifilm [Hungary]

FUJIFILM Electronic Materials offers a wide range of advanced imaging products, to meet the needs of its customers around the world.

The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.

Product Lineup

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ArF (193nm)

Materials for positive dry and immersion imaging, and negative tone development (NTD)

KrF (248nm)

Positive tone KrF photoresists covering a broad range of applications

i-Line, g-Line and Broadband

Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.

Negative (Polyisoprene-based)

Multiple series of negative tone, polyisoprene-based resist systems

e-Beam

Positive and negative tone resist series for a wide array of e-beam imaging applications