These materials are used for wet removal of bulk and thick plating photoresist in single wafer and batch processes
Hungary
Photoresist Strippers
Solvent based strippers for positive and negative tone photoresist removal
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A wide range of wet chemistries for the lithographic process -
Developers
Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
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Solvents
Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
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