FUJIFILM’s family of photoresist strippers provide processing choices and performance advantages over current industry standards for both Aluminum & Copper technology. These materials are used for wet removal of bulk and thick plating photoresist in single wafer and batch processes.
Product Lineup
Positive and negative Photoresist Removal and Post etch residue remover.
- DMSO based
- Microstrip™ 3001 : broadly applicable bulk photoresist stripper
- Microstrip™ 3200 : mild acidic, amine-free stripper with excellent metal compatibility
- Microstrip™ 6800 : single wafer tool applicable photoresist stripper with improved cleaning performance on heavily cross-linked photoresist
- Microstrip™ 6310: Heavy duty Cu compatible photoresist stripper
- Microstrip™ 6365: Heavy duty photoresist stripper widely compatible with various metals, including Al and Cu
- Strippers for Negative Photoresist Removal
- Microstrip™ V
- Stripper for Positive and Negative Photoresist Removal
- Gensolve 470
Featuress & Benefits
- FUJIFILM’s photoresist strippers are designed for optimal performance, low cost of ownership and minimal environmental and health impact
- Packaging options:
- 4 x 4L bottles
- 1 x 20L jerricans
- 200L drums (one way and returnable)
- 1000L IBC’s
