NIL (Nanoimprint Lithography) - Applications

EUV (13.5nm)

EUV materials for negative tone imaging

ArF (193nm)

Materials for positive dry and immersion imaging, and negative tone imaging (NTI)

KrF (248nm)

Positive tone KrF photoresists covering a broad range of applications

i-Line, g-Line and Broadband

Extensive series of mid-uv sensitive photoresists for applications encompassing sub-0.30 µm to >1.0 µm resolution

Negative (Polyisoprene-based)

Multiple series of negative tone, polyisoprene-based resist systems

e-Beam

Positive and negative tone resist series for a wide array of e-beam imaging applications