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Black - Overview

Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

Features & Benefits

AdvantagesProcessing with standard semiconductor equipment
Thinner film thickness and good uniformity
Low reflectance
Small resolution down to 10um
Excellent shielding performance for NIR(NCB)
SpectrumVisible and near infrared (NIR) light sources
TransmittanceNon Carbon Black(NCB):
Extremely low through 300-1800nm
Color pigment based:
Extremely low through 300-700nm
Exposure Dose50~2500mJ/cm2 (i-line)
ResistanceExcellent heat and light resistance
EnvironmentEHS approved raw materials
PackingQuart glass bottle with 0.76L
Gallon glass bottle with 2.89L

 

Available Black product series

  • Non Carbon Black (NCB)
  • Color Pigment Based